DOI Number : 10.5614/itbj.sci.2010.42.1.1
Hits : 12

Nanolithography on the Electron Beam Resist using the Scanning Probe Microscope Cantilever

Lydia Anggraini1, Naoki Matsuzuka2 & Yoshitada Isono3

1Graduate School of Science and Engineering

2College of Science and Engineering, Ritsumeikan University,

1-1-1 Nojihigashi, Kusatsu, Shiga 525-8577, Japan

3Graduate School of Engineering, Kobe University,

1-1 Rokkodai-cho, Nada-ku, Kobe, Hyogo 657-8501, Japan
Email: gr040069@ed.ritsumei.ac.jp


Abstract. This research demonstrates the feasibility of fabricating nanoscale resist patterns on a silicon (Si) substrate using a scanning probe microscope (SPM). In order to utilize scanning probe nanolithography (SPNL) with the other micro-machining techniques such as dry etching, plating and lift-off process, nanoscale resist patterns should be created on an Si substrate with high accuracy in SPNL. We have, so far, established the negative type of SPNL using the negative-tone electron beam (EB) resist named SAL601. The primary objective of this research is to find out appropriate process conditions for establishing the positive type of SPNL using the positive EB resist ″ZEP520A″. This paper describes the variations of experimentally created nano-patterns depending on the process conditions, and determines the appropriate process conditions from the variations obtained. In addition, we analyzed the electric field in the EB resist by a finite element method (FEM), for estimating the line width of the nano-pattern created by SPNL.

Keywords: Scanning probe microscope (SPM); Scanning probe nanolithography (SPNL); Positive-tone electron beam (EB) resist; Direct nano-patterning.

Download Article
 
Bahasa Indonesia | English
 
 
 

Notification:

Begin on 10 October 2014 this website is no longer activated for article process in Journal of Mathematical and Fundamental Sciences, Journal of Engineering and Technological Sciences, Journal of ICT Research and Applications and Journal of Visual Art and Design. The next process will be proceeded under new website at http://journals.itb.ac.id.

For detail information please contact us to: journal@lppm.itb.ac.id.

 
       
       
       ITB Journal Visitor Number #12730813       
       Jl. Tamansari 64, Bandung 40116, Indonesia Visitor IP Address #       
       Tel : +62-22-250 1759 ext. 121 2011 Institut Teknologi Bandung       
       Fax : +62-22-250 4010, +62-22-251 1215 XHTML + CSS + RSS       
       E-mail : journal@lppm.itb.ac.id or proceedings@lppm.itb.ac.id Developed by AVE